Carbon Nanotube Kirkendall effect Optical interferometry A-CNx B2 Quaternary Etching Ambipolar material TiO2 CHLORINE PLASMAS Magnetron sputtering Amorphous NEXAFS AlN V2O3 Aryl-diazonium salts Annealing Adsorption Bipolar resistive switching BRS Biomembranes A3 Physical vapor deposition processes Functionalization X-ray photoelectron spectroscopy BOMBARDMENT Alloying Avalanche breakdown Transfert d'énergie Structure Atomic force microscopy AuCu alloy AZO thin films Band gap Plasmas froids CNTs’ collapse TEM B2 Semiconducting alloys Mass spectrometry Atomic layer etching Nanocomposite Selenization Sputtering Films Ablation laser Thin film Anatase Scanning electron microscopy A Multilayers A1 Characterization Physical vapor deposition Chalcogenide SF 6 CIGSe Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Amyloid precursor Integrated optics Transmission electron microscopy B3 Solar cells Band alignment B Chemical synthesis Thin films PECVD Non-volatile memory A Thin films 3 nm in size XPS Applications industrielles B2 Semiconducting indium compounds Rutile Sol-gel Optical properties CaTiO3Pr^3^+ Calcined clay A Chalcogenides Biocapteurs Colloidal solution Optical waveguides Buffer Couple Capacitance Low-pressure plasma processing Biomasse Alzheimer's disease Resistive switching Plasma etching Carbon Semiconductors Nanotubes Biofilms microbiens Residual stress X-ray diffraction C Photoelectron spectroscopy Mott insulators Mott insulator Copper Titanium dioxide B1 Inorganic compounds Vanadium Sesquioxide Aluminium nitride Bixbyite Oxides Spectroscopic ellipsometry CH4