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Materials and anti-adhesive issues in UV-NIL

Achille Francone 1 
1 Lithography
LTM - Laboratoire des technologies de la microélectronique
Abstract : The UV curing nanoimprint lithography (UV-NIL) is a next generation lithography technique that can produce very tiny patterns (in the nanometer scale) by a simple imprinting step performed with a patterned and transparent template in a flowable resist (deposed par spin-coating on a silicon substrate as thin layer). The imprinting step is then followed by UV exposure (that cures the resist) and demolding. Due to its high potential in replicating patterns with high resolution, UV-NIL is considered nowadays as a possible candidate to perform the lithographic step in the next generation integrated circuits. Two critical issues threaten the spreading of UV-NIL at large scale: defects generated during imprinting step (depending on the resist flowing behaviour) and short life-time of a treated mold (a fluorinated self assembled monolayer, F-SAM, is deposed on the mold surface to avoid the sticking of the resist). Concerning the first issue, a model potentially capable to predict the flowing distance of liquid photo curable resist is presented. The experiments performed over the second issue were really profitable and gave interesting results. In fact, a better understanding on the mechanisms of ASL degradation was achieved. This aging is due to a chemical attack (exerted by free radicals, which was generated into the uv curable resist during polymerization step, toward the fluorinated molecule, and conditioned as well by the chemical nature of the resist) and a mechanical degradation (caused by the stress exerted during demolding step and linked to the quality of F-SAM grafting on the mold surface). The add of fluorinated surfactants in the chemical formulation of the resist represent an effective solution for improving the number of imprints performed employing the same mold. At the end of this manuscript there is the presentation of a hybrid (organic-inorganic) resist, that was synthesized for a real useful application: the creation of templates to arrange at large scale (few millimetres) di-bloc copolymers (sized of few nanometres) by graphoepitaxy.
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Submitted on : Friday, February 3, 2012 - 2:40:40 PM
Last modification on : Friday, March 25, 2022 - 11:09:52 AM
Long-term archiving on: : Wednesday, December 14, 2016 - 4:18:28 AM


  • HAL Id : tel-00666073, version 1



Achille Francone. Materials and anti-adhesive issues in UV-NIL. Materials. Institut National Polytechnique de Grenoble - INPG, 2010. English. ⟨NNT : ⟩. ⟨tel-00666073⟩



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